APPLICATIONS
Appistry Delivers Appistry Enterprise Application Fabric 3.5
- Streamlined development and deployment – Application developers and architects can now unlock the full benefits of Appistry EAF without changing the code that powers their applications. By simply “annotating” their POJO (plain old Java object) or PONO (plain old .NET object) applications with source-level metadata, developers can readily exploit the scalability, reliability and parallelism provided by the application fabric environment.
- Enhanced capabilities for stateful applications – Appistry enhances its support for working with data cached in its Fabric Accessible Memory (FAM) — a reliable, in-memory data grid for application state information. With this new version, developers can effortlessly utilize rich, cross-platform map and array data types in FAM. In addition, user-defined complex types may be used as well; the fabric software automatically and transparently performs data serialization as needed.
- Improved performance – Appistry EAF 3.5 represents the culmination of significant investments in optimizing the software’s performance. These optimizations have culminated in throughput increases in excess of 10x for transactional applications and 4x for data-intensive applications. As a result, customers are able to maximize processing capability while getting the most out of computing infrastructure investments.
- Framework inherited agility and flexibility – Whether working with new applications, or refactoring applications never intended to run in a distributed manner, Appistry EAF 3.5 allows customers to scale applications across tens or even hundreds of computers and more quickly than ever before. Developers and architects can now get up and running with Appistry’s application fabric in no time.
“Traditional approaches to developing software applications at the scale required by our business is a growing challenge for our developers, not to mention the burden on our pocketbook of buying and operating expensive proprietary hardware,” said Ray Helmering, vice president of photogrammetric engineering at GeoEye. “By relying on the application fabric to provide scalability, reliability and manageability, we can leave our infrastructure concerns behind and focus on providing maximum value to our customers.” Availability Appistry EAF 3.5 is available immediately. ServerSide Java Symposium attendees may visit Appistry’s booth for a full demonstration of Appistry EAF 3.5. Additionally, Appistry’s co-founder and chief strategist Bob Lozano will be a part of the Symposium’s Industry Leaders Technology Panel on High Performance Architecture on March 22, 4:05-5pm.