ECONOMICS
Extraction Clears 193nm Lithography Hurdle
FRANKLIN, MA –Extraction Systems today introduced the Extraction 3000, a next-generation hybrid filter system designed to safeguard optics and resists in 193nm lithography systems. The Extraction 3000 filter system specifically targets molecular acids, bases, and condensables - a new and broader range of contaminants threatening optical components and thinner, more sensitive resists in advanced lithography.