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WILSONVILLE, OR -- Mentor Graphics Corporation (Nasdaq:MENT), today announced a strategic extension of its Calibre(R) technology, the industry standard in integrated circuit (IC) physical verification and manufacturability, to include the capability to export IC layout data directly into mask-writer formats. Mask data preparation (MDP) is a serious bottleneck in the semiconductor industry, with data volumes exploding as dimensions shrink and data-intensive resolution enhancement technology (RET) is adopted. If data is handled incorrectly or flattened too early in the process, the volume of IC data can increase by a factor of 10 or more. This increase creates a disproportionate increase in mask-writing and inspection time, severely impacting capital equipment utilization for mask manufacturers. This extension of Calibre, based on its powerful hierarchical engine, preserves design hierarchy well into the mask data preparation stage. It allows users to continue using and developing RET for advanced IC lithography while avoiding the complications and problems of data volume and hierarchy management of previous MDP solutions. It also eliminates the need for a stand-alone fracturing utility and an extra conversion to a closed, proprietary intermediate data format. The MDP problem has become so critical that SEMI, the worldwide semiconductor equipment and materials standards organization, has initiated a task force to address interoperability issues that occur between the design automation and mask-making communities. To ensure the write-time efficiency of the export data generated by Calibre, Mentor Graphics has worked closely with mask-writer equipment engineers and advanced mask manufacturers. "In 1996, Calibre brought modern hierarchy to DRC/LVS; in 1999, the Calibre architecture was extended to hierarchical RET. This year, our customers gave us compelling reasons to extend into MDP and complete the flow," said Joseph Sawicki, general manager, Calibre Business Unit. "We are very pleased at the collaboration with the mask equipment industry and leading-edge customers who want a modern, complete solution for design-to-silicon needs, especially at the 130 and 100nm nodes." For more information visit www.mentor.com