APPLICATIONS
Tripos' Suite of Applications Is Now Available on Three Platforms
- Written by: Writer
- Category: APPLICATIONS
ST. LOUIS -- Tripos, Inc. (NASDAQ:TRPS) , a leading provider of drug discovery informatics products and chemistry research, today announced the release of its industry-leading SYBYL(R) suite of applications on industry-standard HP Integrity servers and Intel Itanium-based workstations running the HP-UX operating system. Tripos' computational chemistry software products are now available on three platforms: Linux, SGI and HP's Itanium-based systems running HP-UX and Linux. "The sophisticated tools that Tripos offers are positioned in multiple ways to take advantage of the ever-increasing computational power available," said Dr. Trevor Heritage, senior vice president and general manager of discovery informatics at Tripos. "Our tools for QSAR, ADME and virtual screening, combined with the kind of computational power available in this new architecture, will allow our customers to perform virtual experiments and analysis unthinkable just several years ago." The leading role the Itanium series plays in scientific computing together with the Intel architecture should enable them to fulfill Moore's Law of doubling computational power every 18 months. Tripos chose this strategic direction to continue its efforts to expedite the drug discovery process for the industry. "HP today delivers industry-standard Itanium-based systems that use the world-class HP services and support organization to solve technical computing and application challenges," said Winston Prather, vice president and general manager, High Performance Technical Computing, HP. "We work with a wide range of technical computing partners like Tripos, helping them to offer customers the flexibility of a high-performance technical platform for faster drug discovery." Tripos will be demonstrating its newly released SYBYL 6.9.1 modules, FlexX-Pharm(TM)(*) and FUGUE(TM), on HP Itanium-based servers and workstations in Booth 303 at the American Chemical Society's 226th National Meeting, being held at the Jacob K. Javits Convention Center in New York City Sept. 8-10, 2003.